User login

Lithography Simulation for the Fabrication of Silicon Photonic Devices with Deep-Ultraviolet Lithography

Publication Type:

Conference Paper

Source:

IEEE International Conference on Group IV Photonics (GFP), San Diego, California, p.288-290 (2012)

URL:

http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6324162

Abstract:

We demonstrate the lithography simulation for the fabrication of silicon photonic devices using deep-ultraviolet lithography. Once the distortions arising from the fabrication process are accounted for, the comparison between predicted and measured results is excellent.

Full Text:

http://www.mina.ubc.ca/files/GFP2012Xu.pdf

Faculty Member(s): 
Lukas.Chrostowski
Faculty Member(s): 
Nicolas.Jaeger
Research Area(s): 
Photonics and Optics