Lithography Simulation for the Fabrication of Silicon Photonic Devices with Deep-Ultraviolet Lithography
Publication Type:Conference Paper
Source:IEEE International Conference on Group IV Photonics (GFP), San Diego, California, p.288-290 (2012)
We demonstrate the lithography simulation for the fabrication of silicon photonic devices using deep-ultraviolet lithography. Once the distortions arising from the fabrication process are accounted for, the comparison between predicted and measured results is excellent.