%0 Conference Paper %B IEEE International Conference on Group IV Photonics (GFP) %D 2012 %T Lithography Simulation for the Fabrication of Silicon Photonic Devices with Deep-Ultraviolet Lithography %A Wang, Xu %A Shi, Wei %A Hochberg, Michael %A Adam, Kostas %A Schelew, Ellen %A Young, Jeff %A Jaeger, Nicolas %A Chrostowski, Lukas %C San Diego, California %P 288-290 %U http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6324162 %X We demonstrate the lithography simulation for the fabrication of silicon photonic devices using deep-ultraviolet lithography. Once the distortions arising from the fabrication process are accounted for, the comparison between predicted and measured results is excellent. %8 08/2012