@inproceedings { XuGFP2012, title = {Lithography Simulation for the Fabrication of Silicon Photonic Devices with Deep-Ultraviolet Lithography}, journal = {IEEE International Conference on Group IV Photonics (GFP)}, year = {2012}, month = {08/2012}, pages = {288-290}, address = {San Diego, California}, abstract = {We demonstrate the lithography simulation for the fabrication of silicon photonic devices using deep-ultraviolet lithography. Once the distortions arising from the fabrication process are accounted for, the comparison between predicted and measured results is excellent.}, URL = {http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6324162}, author = {Xu Wang and Wei Shi and Michael Hochberg and Kostas Adam and Ellen Schelew and Jeff F. Young and Nicolas A. F. Jaeger and Lukas Chrostowski} }