@article { Xia2004, title = {?Impact of ion implantation damage and thermal budget on mobility enhancement in strained-Si N-channel MOSFETs}, journal = {IEEE Transactions on Electron Devices}, volume = {51}, year = {2004}, month = {12/2004}, author = {Guangrui Xia, H. M. Nayfeh, M. L. Lee, E. A. Fitzgerald, D. A. Antoniadis, D. H. Anjum, J. Li,R. Hull, N. Klymko, and J. L. Hoyt} }